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Title: The use of BaF sub 2 buffer layers for the sputter-deposition of TlCaBaCuO thin-film superconductors

Conference ·
OSTI ID:5212457

Thin films of the Tl-based superconductors often have relatively poor properties because of film/substrate interdiffusion which occurs during the anneal. We have therefore investigated the use of BaF{sub 2} as a diffusion barrier. TlCaBaCuO thin films were deposited by dc magnetron sputtering onto MgO <100> substrates, both with and without an evaporation-deposited BaF{sub 2} buffer layer, and post-annealed in a Tl over-pressure. Electrical properties of the films were determined by four-point probe analysis, and compositions were measured by ion-backscattering spectroscopy. Structural analysis was performed by x-ray diffraction and scanning electron microscopy. The BaF{sub 2} buffer layers were found to significantly improve the properties of the TlCaBaCuO thin films. 8 refs., 3 figs.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
DOE/MA
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
5212457
Report Number(s):
LA-UR-89-4205; CONF-891119-50; ON: DE90004859
Resource Relation:
Conference: Materials Research Society fall meeting, Boston, MA (USA), 27 Nov - 2 Dec 1989
Country of Publication:
United States
Language:
English