Lowering the crystallization temperature of thin-film shape memory effect TiNi by cold-working for smart materials fabrication

Journal Article · Sun May 01 00:00:00 EDT 1994 · Scripta Metallurgica et Materialia; (United States)

DOI:https://doi.org/10.1016/0956-716X(94)90337-9· OSTI ID:5189982

Madsen, J S; Jardine, A P ^[1]

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1. State Univ. of New York, Stony Brook, NY (United States). Dept. of Materials Science and Engineering

Cold-working has been demonstrated to lower the crystallization temperature for amorphous, free-standing TiNi by approximately 100 C, making it potentially integratable with certain polymeric materials. If cold-working initiates lower temperature nucleation by increasing lattice defects, then lower annealing temperatures may be successful in producing thin-film TiNi on reactive low-temperature substrates.

• OSTI ID: 5189982
• Journal Information: Scripta Metallurgica et Materialia; (United States), Vol. 30:9; ISSN 0956-716X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
NICKEL ALLOYS
COLD WORKING
CRYSTALLIZATION
TITANIUM ALLOYS
COMPOSITE MATERIALS
HETEROJUNCTIONS
INTERMETALLIC COMPOUNDS
LAYERS
TEMPERATURE DEPENDENCE
ALLOYS
FABRICATION
JUNCTIONS
MATERIALS
MATERIALS WORKING
PHASE TRANSFORMATIONS
SEMICONDUCTOR JUNCTIONS
360101* - Metals & Alloys- Preparation & Fabrication
360102 - Metals & Alloys- Structure & Phase Studies