Microprocessor controlled ultrahigh vacuum evaporations of critical thin films, multilayer structures, and coevaporated materials

Journal Article · Sun May 01 00:00:00 EDT 1988 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.575196· OSTI ID:5187988

Fischer, H; Grob, M; Peter, G; Koprio, J A

The use of a quadrupole mass spectrometer as a rate monitor is described for a fast and accurate deposition control down to very low evaporation rates in an ultrahigh vacuum plant. In several applications of this concept, a rate control down to 0.1 A/s in single-source and coevaporation experiments could be documented for different materials and material combinations. The feasibility of operation at oxygen gas pressures of up to 4.5 x 10/sup -5/ mbar is shown for yttrium/copper coevaporations. Multilayer structures were deposited under microprocessor control with the same rate control method used.

• Research Organization: Balzers AG, FL-9496-Balzers, Liechtenstein
• OSTI ID: 5187988
• Journal Information: J. Vac. Sci. Technol., A; (United States), Vol. 6:3
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COPPER
VACUUM COATING
VACUUM EVAPORATION
CONTROL SYSTEMS
MASS SPECTROSCOPY
YTTRIUM
DEPOSITION
EPITAXY
LAYERS
MASS SPECTROMETERS
OPERATION
THIN FILMS
ULTRAHIGH VACUUM
ELEMENTS
EVAPORATION
FILMS
MEASURING INSTRUMENTS
METALS
PHASE TRANSFORMATIONS
SPECTROMETERS
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENTS
360101* - Metals & Alloys- Preparation & Fabrication