Influence of substrate temperature on the optical properties of ion-assisted reactively evaporated vanadium oxide thin films

Journal Article · Sun May 01 00:00:00 EDT 1988 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.575229· OSTI ID:5186858

Case, F C

The properties of vanadium dioxide (VO/sub 2/) films bombarded with oxygen ions during deposition are examined as a function of substrate temperature. Electrical and optical properties of the as-deposited films are discussed. After annealing to the VO/sub 2/ form, these films exhibit phase transition temperatures reduced from a nominal 67 /sup 0/C, the lowest thus far in this series being 38 /sup 0/C. Rutherford backscattering analysis indicates low-level tungsten contamination of the films, presumably from the ion gun filaments. The contaminant has a role in properties modification but does not provide a complete explanation for our observations.

• Research Organization: LTV Missiles and Electronics Group, Dallas, Texas 75265-0003
• OSTI ID: 5186858
• Journal Information: J. Vac. Sci. Technol., A; (United States), Vol. 6:3
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
VANADIUM OXIDES
CRYSTAL STRUCTURE
ELECTRICAL PROPERTIES
OPTICAL PROPERTIES
ANNEALING
BACKSCATTERING
CONTAMINATION
DEPOSITION
ION COLLISIONS
MEDIUM TEMPERATURE
PHASE TRANSFORMATIONS
THIN FILMS
VACUUM COATING
VACUUM EVAPORATION
CHALCOGENIDES
COLLISIONS
EVAPORATION
FILMS
HEAT TREATMENTS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SCATTERING
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
VANADIUM COMPOUNDS
360104* - Metals & Alloys- Physical Properties