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Title: Organometallic vapor-phase epitaxy of high-quality Ga sub 0. 51 In sub 0. 49 P at high growth rates

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.343682· OSTI ID:5176737
; ; ; ;  [1]
  1. Departments of Materials Science and Engineering and Electrical Engineering, University of Utah, Salt Lake City, Utah 84112 (US)

High-quality Ga{sub 0.51}In{sub 0.49}P, lattice-matched to GaAs, has been grown by atmospheric pressure organometallic vapor-phase epitaxy. The growth was performed at a temperature of 680 {degree}C and a growth rate of about 12 {mu}m/h. The indium distribution coefficient was found to be unity at this growth temperature. At a V/III ratio of 148, the Ga{sub 0.51}In{sub 0.49}P epilayers had photoluminescence (PL) half-widths of 35 and 7.2 meV at 300 and 10 K, respectively, the best reported results to date. As the V/III ratio was changed from 94 to 240, the 300-K energy band gap measured by PL varied only from 1.897 to 1.912 eV, values close to that of Ga{sub 0.51}In{sub 0.49}P grown by liquid-phase epitaxy. An ordered arrangement of gallium and indium atoms on the column III sublattice with a Cu-Pt structure was observed in transmission electron diffraction patterns for all samples. Our results show that the phenomenon of changing energy band gap with varying V/III ratio does not occur at these high growth rates.

OSTI ID:
5176737
Journal Information:
Journal of Applied Physics; (USA), Vol. 66:11; ISSN 0021-8979
Country of Publication:
United States
Language:
English