Deposition of diamond-like carbon film using electron cyclotron resonance plasma

Journal Article · Mon Nov 11 00:00:00 EST 1991 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.105943· OSTI ID:5160212

Kuo, S C; Kunhardt, E E ^[1]; Srivatsa, A R ^[2]

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1. Weber Research Institute, Polytechnic University, Farmingdale, New York (USA)
2. Moltech Corp., Chemistry Department, SUNY at Stony Brook, Stony Brook, New York (USA)

Hard diamond-like carbon films were deposited on Si(100) substrates using a CH{sub 4} plasma created through electron cyclotron resonance (ECR) heating. The ECR plasma was excited by a Lisitano coil. These films could be deposited with a negative dc bias ({minus}200 V) or a rf-induced negative self-bias ({minus}100 V) on the substrates. The deposition rate of the film was about 2.3 A/s. The deposited films were characterized by Raman spectroscopy and near-edge x-ray absorption fine structure analysis.

• OSTI ID: 5160212
• Journal Information: Applied Physics Letters; (United States), Vol. 59:20; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DIAMONDS
AMORPHOUS STATE
CHEMICAL VAPOR DEPOSITION
ABSORPTION SPECTROSCOPY
ECR HEATING
PLASMA
RAMAN SPECTROSCOPY
CARBON
CHEMICAL COATING
DEPOSITION
ELEMENTAL MINERALS
ELEMENTS
HEATING
HIGH-FREQUENCY HEATING
LASER SPECTROSCOPY
MINERALS
NONMETALS
PLASMA HEATING
SPECTROSCOPY
SURFACE COATING
360601* - Other Materials- Preparation & Manufacture