High quality oxide films on substrates
Patent
·
OSTI ID:5159237
A method is described for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material. 4 figures.
- DOE Contract Number:
- AC02-76CH00016
- Assignee:
- Associated Universities, Inc., Washington, DC ()
- Patent Number(s):
- US 5282903; A
- Application Number:
- PPN: US 7-974455
- OSTI ID:
- 5159237
- Resource Relation:
- Patent File Date: 12 Nov 1992
- Country of Publication:
- United States
- Language:
- English
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