The high-strain-rate and spallation response of tantalum, Ta-10W, and T-111
The compressive true stress-true response of tantalum, Ta-10W, and T-111 were found to depend on the applied strain rate, in the range 0.001 to 7000 s{sup {minus}1}. The strain-rate sensitivities of the flow stress of tantalum, Ta-10W, and T-111 a 1% strain are 0.062, 0.031, and 0.024, respectively. The rates of strain hardening in Tantalum, Ta-10W, and T-111 are seen to exhibit differing behavior with increasing strain rate. The calculated average strain-hardening rate in tantalum, {Theta}, for the quasi-static (0.001 s{sup {minus}1}) data at 25{degrees}C is 2080 MPa/unit strain. The hardening rate at 3000s{sup {minus}1} at 25{degrees}C decreases to 846 MPa/unit strain. Normalizing the work hardening rate in tantalum with the Taylor Factor for a random polycrystal, ({Theta} / (3.07){sup 2}), yields work hardening rates of {mu}/276 at quasi-static strain rates and {mu}/680 at high-rates, assuming a shear modulus of 61 GPa for tantalum at room temperature. While the work hardening of all the tantalum-based materials are similar at quasi-static rates, alloying results in a small reduction in hardening rate. With increasing strain rate, the work hardening rate in tantalum decreases by approximately a factor of two compared to the alloys. Alloying tantalum with substitutional or interstitial elements is thought to result in increased edge dislocation storage and screw dislocation cross-slip due to interactions with the alloying elements at high strain rates. 28 refs.
- Research Organization:
- Los Alamos National Lab., NM (United States)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 5126507
- Report Number(s):
- LA-UR-91-3160; CONF-911003-20; ON: DE92002446
- Resource Relation:
- Conference: Fall meeting of the Minerals, Metals and Materials Society of AIME and Materials Week of the American Society of Metals, Cincinnati, OH (United States), 20-24 Oct 1991
- Country of Publication:
- United States
- Language:
- English
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