Survey of high-voltage pulse technology suitable for large-scale plasma source ion implantation processes
- Los Alamos National Laboratory, Los Alamos, New Mexico 87544 (United States)
Many new plasma processes ideas are finding their way from the research lab to the manufacturing plant floor. These require high voltage (HV) pulse power equipment, which must be optimized for application, system efficiency, and reliability. Although no single HV pulse technology is suitable for all plasma processes, various classes of high voltage pulsers may offer a greater versatility and economy to the manufacturer. Technology developed for existing radar and particle accelerator modulator power systems can be utilized to develop a modern large scale plasma source ion implantation (PSII) system. The HV pulse networks can be broadly defined by two classes of systems, those that generate the voltage directly, and those that use some type of pulse forming network and step-up transformer. This article will examine these HV pulse technologies and discuss their applicability to the specific PSII process. Typical systems that will be reviewed will include high power solid state, hard tube systems such as crossed-field hollow beam'' switch tubes and planar tetrodes, and soft'' tube systems with crossatrons and thyratrons. Results will be tabulated and suggestions provided for a particular PSII process.
- OSTI ID:
- 5118921
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 12:2; ISSN 0734-211X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ION IMPLANTATION
PULSE TECHNIQUES
SEMICONDUCTOR MATERIALS
HIGH-VOLTAGE PULSE GENERATORS
MANUFACTURING
MODULATION
OPTIMIZATION
PLASMA
ELECTRONIC EQUIPMENT
EQUIPMENT
FUNCTION GENERATORS
MATERIALS
PULSE GENERATORS
665300* - Interactions Between Beams & Condensed Matter- (1992-)