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Title: Initial operation of a large-scale plasma source ion implantation experiment

Abstract

In plasma source ion implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions are accelerated toward the workpiece and implanted in its surface. A large-scale PSII experiment has recently been assembled at Los Alamos, in which stainless steel and aluminum workpieces with surface areas over 4 m[sup 2] have been implanted in a 1.5 m diam, 4.6 m length cylindrical vacuum chamber. Initial implants have been performed at 50 kV with 20 [mu]s pulses of 53 A peak current, repeated at 500 Hz, although the pulse modulator will eventually supply 120 kV pulses of 60 A peak current at 2 kHz. A 1000 W, 13.56 MHz capacitively coupled source produces nitrogen plasma densities in the 10[sup 15] m[sup [minus]3] range at neutral pressures as low as 0.02 mTorr. A variety of antenna configurations have been tried, with and without axial magnetic fields of up to 60 G. Measurements of sheath expansion, modulator voltage and current, and plasma density fill-in following a pulse are presented. We consider secondary electron emission, x-ray production, workpiece arcing, implant conformality, and workpiece and chamber heating.

Authors:
; ; ; ; ; ;  [1]
  1. (Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States))
Publication Date:
OSTI Identifier:
5118782
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
Additional Journal Information:
Journal Volume: 12:2; Journal ID: ISSN 0734-211X
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; ION IMPLANTATION; PLASMA; ALUMINIUM; LOS ALAMOS; NITROGEN IONS; OPERATION; RESEARCH PROGRAMS; SECONDARY EMISSION; STAINLESS STEELS; ALLOYS; CHARGED PARTICLES; DEVELOPED COUNTRIES; ELEMENTS; EMISSION; HIGH ALLOY STEELS; IONS; IRON ALLOYS; IRON BASE ALLOYS; METALS; NEW MEXICO; NORTH AMERICA; STEELS; URBAN AREAS; USA; 665300* - Interactions Between Beams & Condensed Matter- (1992-); 360106 - Metals & Alloys- Radiation Effects

Citation Formats

Wood, B.P., Henins, I., Gribble, R.J., Reass, W.A., Faehl, R.J., Nastasi, M.A., and Rej, D.J. Initial operation of a large-scale plasma source ion implantation experiment. United States: N. p., 1994. Web. doi:10.1116/1.587362.
Wood, B.P., Henins, I., Gribble, R.J., Reass, W.A., Faehl, R.J., Nastasi, M.A., & Rej, D.J. Initial operation of a large-scale plasma source ion implantation experiment. United States. doi:10.1116/1.587362.
Wood, B.P., Henins, I., Gribble, R.J., Reass, W.A., Faehl, R.J., Nastasi, M.A., and Rej, D.J. Tue . "Initial operation of a large-scale plasma source ion implantation experiment". United States. doi:10.1116/1.587362.
@article{osti_5118782,
title = {Initial operation of a large-scale plasma source ion implantation experiment},
author = {Wood, B.P. and Henins, I. and Gribble, R.J. and Reass, W.A. and Faehl, R.J. and Nastasi, M.A. and Rej, D.J.},
abstractNote = {In plasma source ion implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions are accelerated toward the workpiece and implanted in its surface. A large-scale PSII experiment has recently been assembled at Los Alamos, in which stainless steel and aluminum workpieces with surface areas over 4 m[sup 2] have been implanted in a 1.5 m diam, 4.6 m length cylindrical vacuum chamber. Initial implants have been performed at 50 kV with 20 [mu]s pulses of 53 A peak current, repeated at 500 Hz, although the pulse modulator will eventually supply 120 kV pulses of 60 A peak current at 2 kHz. A 1000 W, 13.56 MHz capacitively coupled source produces nitrogen plasma densities in the 10[sup 15] m[sup [minus]3] range at neutral pressures as low as 0.02 mTorr. A variety of antenna configurations have been tried, with and without axial magnetic fields of up to 60 G. Measurements of sheath expansion, modulator voltage and current, and plasma density fill-in following a pulse are presented. We consider secondary electron emission, x-ray production, workpiece arcing, implant conformality, and workpiece and chamber heating.},
doi = {10.1116/1.587362},
journal = {Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)},
issn = {0734-211X},
number = ,
volume = 12:2,
place = {United States},
year = {1994},
month = {3}
}