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Title: Strain stabilized metal{endash}insulator transition in epitaxial thin films of metallic oxide CaRuO{sub 3}

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.118741· OSTI ID:508930
; ;  [1]; ; ;  [2]; ;  [3]
  1. Department of Mechanical Engineering and Materials Science, Duke University, Durham, North Carolina 27708 (United States)
  2. Lucent Technology/Bell Laboratories, Murray Hill, New Jersey 07974 (United States)
  3. Department of Physics, University of Virginia, Charlottesville, Virginia 22903 (United States)

We report the observation of both metallic and semiconducting behavior in epitaxial thin films of the metallic oxide CaRuO{sub 3} deposited under identical conditions. X-ray diffraction studies showed that while semiconducting films with enlarged unit cells were obtained on single-crystal (100) SrTiO{sub 3} substrates, metallic films with lattice parameters close to the bulk material grew on (100) LaAlO{sub 3} substrates and poor crystalline quality SrTiO{sub 3} substrates. It is believed that a strain induced substitution of the small Ru{sup 4+} cations by the larger Ca{sup 2+} cations occurs, breaking the conduction pathway within the three-dimensional network of the RuO{sub 6} octahedra and leading to a metal{endash}insulator transition. This unique phenomenon, which is not observed in bulk material, can be significant in technologically important epitaxial perovskite oxide heterostructures. {copyright} {ital 1997 American Institute of Physics.}

OSTI ID:
508930
Journal Information:
Applied Physics Letters, Vol. 70, Issue 22; Other Information: PBD: Jun 1997
Country of Publication:
United States
Language:
English