Development of passive electronic components for instrumentation of improved geothermal logging tools and components. Semiannual progress report. Report No. 1. [For temperatures up to 500/sup 0/C]
Research progress is reported on the development of passive components, resistors, capacitors, metallization, and passivation, that will withstand well logging temperatures to 500/sup 0/C and have extremely low temperature coefficients. The lower the temperature coefficients, the more exacting the instrumentation designs can be without elaborate compensation techniques. The method of fabricating the thin film components is that of chemical vapor deposition (CVD) which is a major deviation from the standard approach. The films are grown in a CVD reactor by passing various reactant gases over a heated substrate. The reactor was modified in order to accommodate the gases needed in the deposition of metals. The reactor can be operated over a temperature range of 400/sup 0/C to greater than 1200/sup 0/C, and at any pressure between atmospheric and 1 x 10/sup -3/ torr. Tungsten, tungsten-silicon, and silicon nitride were successfully deposited on oxidized silicon wafers. The tungsten is used for interconnects and capacitor plates, tungsten-silicon is used as a high resistivity material for resistors, and silicon nitride is used as a dielectric for the capacitors and as a passivation layer. The materials are currently being studied in terms of their deposition parameters and electrical characteristics.
- Research Organization:
- Arizona Univ., Tucson (USA). Solid State Engineering Lab.
- DOE Contract Number:
- EY-76-S-02-4081
- OSTI ID:
- 5063302
- Report Number(s):
- COO-4081-1
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
47 OTHER INSTRUMENTATION
42 ENGINEERING
GEOTHERMAL WELLS
WELL LOGGING
MICROELECTRONIC CIRCUITS
FABRICATION
CAPACITORS
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
DESIGN
DIAGRAMS
EQUIPMENT
FILMS
GASES
HIGH TEMPERATURE
PASSIVATION
RESEARCH PROGRAMS
RESISTORS
SEMICONDUCTOR DEVICES
SILICON NITRIDES
THERMIONIC TUBES
TUNGSTEN
TUNGSTEN SILICIDES
VAPOR DEPOSITED COATINGS
VERY HIGH TEMPERATURE
CHEMICAL COATING
COATINGS
DEPOSITION
ELECTRICAL EQUIPMENT
ELECTRON TUBES
ELECTRONIC CIRCUITS
ELEMENTS
FLUIDS
METALS
NITRIDES
NITROGEN COMPOUNDS
PNICTIDES
REFRACTORY METALS
SILICIDES
SILICON COMPOUNDS
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN COMPOUNDS
WELLS
Geothermal Legacy