A new technique for imaging the logic state of passivated conductors: Biased resistive contrast imaging
Abstract
A new scanning electron microscopy imaging technique has been developed to examine the logic state of conductors on passivated CMOS integrated circuits. This technique employs a modified Resistive Contrast Imaging system to acquire image data on powered devices. The image is generated by monitoring subtle shifts in the power supply current of an integrated circuit as an electron beam is scanned over the device surface. The images produced with this new technique resemble voltage contrast data from devices with the passivation removed and the surface topography subtracted. Non-destructive applications of this imaging method to functional and failed integrated circuits are described. Possible irradiation effects and methods to minimize them are also discussed. 2 refs., 1 fig.
- Authors:
- Publication Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- DOE/DP
- OSTI Identifier:
- 5042262
- Report Number(s):
- SAND-89-2384C; CONF-900304-1
ON: DE90000666
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Conference
- Resource Relation:
- Conference: International reliability physics symposium, New Orleans, LA (USA), 26-29 Mar 1990
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; 47 OTHER INSTRUMENTATION; INTEGRATED CIRCUITS; NONDESTRUCTIVE TESTING; IMAGE PROCESSING; IMAGES; RESOLUTION; SCANNING ELECTRON MICROSCOPY; ELECTRON MICROSCOPY; ELECTRONIC CIRCUITS; MATERIALS TESTING; MICROELECTRONIC CIRCUITS; MICROSCOPY; PROCESSING; TESTING; 426000* - Engineering- Components, Electron Devices & Circuits- (1990-); 440800 - Miscellaneous Instrumentation- (1990-)
Citation Formats
Cole, Jr, E I. A new technique for imaging the logic state of passivated conductors: Biased resistive contrast imaging. United States: N. p., 1990.
Web.
Cole, Jr, E I. A new technique for imaging the logic state of passivated conductors: Biased resistive contrast imaging. United States.
Cole, Jr, E I. 1990.
"A new technique for imaging the logic state of passivated conductors: Biased resistive contrast imaging". United States. https://www.osti.gov/servlets/purl/5042262.
@article{osti_5042262,
title = {A new technique for imaging the logic state of passivated conductors: Biased resistive contrast imaging},
author = {Cole, Jr, E I},
abstractNote = {A new scanning electron microscopy imaging technique has been developed to examine the logic state of conductors on passivated CMOS integrated circuits. This technique employs a modified Resistive Contrast Imaging system to acquire image data on powered devices. The image is generated by monitoring subtle shifts in the power supply current of an integrated circuit as an electron beam is scanned over the device surface. The images produced with this new technique resemble voltage contrast data from devices with the passivation removed and the surface topography subtracted. Non-destructive applications of this imaging method to functional and failed integrated circuits are described. Possible irradiation effects and methods to minimize them are also discussed. 2 refs., 1 fig.},
doi = {},
url = {https://www.osti.gov/biblio/5042262},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1990},
month = {Mon Jan 01 00:00:00 EST 1990}
}