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Title: Computer-controlled ion beam sputter-deposition of superconducting oxide films. Technical report, 1 July 1988-30 June 1989

Technical Report ·
OSTI ID:5042230

The goals of this project are: (1) the development of a new method for the fabrication of superconducting oxide thin films, viz computer-controlled ion beam sputter deposition; and (2) the fabrication of YBa{sub 2}Cu{sub 3}O(7-delta) thin films and devices using this method. In the early stage of the project it was demonstrated that the use of complex multicomponent sputter targets such as ceramic YBa{sub 2}Cu{sub 3}O(7-delta) present significant problems for compositional control. The new computer-controlled ion-beam sputter-deposition system was developed. The key features include: (1) a rotatable target holder assembly, which serves to position elemental targets under the ion beam in a rapid sequence, (2) a primary ion beam to produce a sputtered flux from the targets, (3) a secondary oxygen beam (ionic, atomic, or reactive oxygen (ozone)) to oxygenate the film and lower the required deposition temperature, (4) complete computer interfacing to provide real-time feedback on the thickness of the depositing species and control of the above items. In terms of the superconductor device objectives, the system is designed to allow for low-temperature deposition for integrated devices, compositional control and flexibility, and for scaling to a commercial system. The capability of the system for controlled sequential deposition of layered structures is fundamental for the production of heterostructures and sandwich junctions (superconductor-insulator-superconductor and superconductor-normal-superconductor). This is demanding due to the short coherence lengths in the oxide superconductors.

Research Organization:
North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering
OSTI ID:
5042230
Report Number(s):
AD-A-213921/0/XAB
Country of Publication:
United States
Language:
English