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Title: Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO sub 3 radicals and O sub 3 at 297 + 2K

Abstract

Rate constants for the gas-phase reactions of tetramethylsilane, hexamethyldisiloxane, hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, and decamethylcyclopentasiloxane with OH and NO{sub 3} radicals and O{sub 3} have been determined at 297 {plus minus} 2 K. The rate constants obtained for these OH radical, NO{sub 3} radical, and O{sub 3} reactions (in cm{sup 3} molecule{sup {minus}1} s{sup {minus}1} units), respectively, were as follows: for tetramethylsilane, 1.00 {times} 10{sup {minus}12}, < 8 {times} 10{sup {minus}17}, and < 7 {times} 10{sup {minus}21}; for hexamethyldisiloxane, 1.38 {times} 10{sup {minus}12}, < 8 {times} 10{sup {minus}17}, and < 7 {times} 10{sup {minus}21}; for hexamethylcyclotrisiloxane, 5.2 {times} 10{sup {minus}13}, < 2 {times} 10{sup {minus}16}, and < 3 {times} 10{sup {minus}20}; for octamethylcyclotetrasiloxane, 1.01 {times} 10{sup {minus}12}, < 2 {times} 10{sup {minus}16}, and < 3 {times} 10{sup {minus}20}, and for decamethylcyclopentasiloxane, 1.55 {times} 10{sup {minus}12}, < 3 {times} 10{sup {minus}16}, and < 3 {times} 10{sup {minus}20}. The NO{sub 3} radical and O{sub 3} reactions are calculated to be of no importance as tropospheric removal processes for these compounds. The calculated lifetimes of these volatile organosilicon compounds in the troposphere due to chemical reaction with the OH radical range from {approximately}10 days for decamethylcylopentasiloxane to {approximately}30 days for hexamethycylclotrisiloxane.

Authors:
 [1]
  1. Univ. of California, Riverside (United States)
Publication Date:
OSTI Identifier:
5019780
Resource Type:
Journal Article
Journal Name:
Environmental Science and Technology; (United States)
Additional Journal Information:
Journal Volume: 25:5; Journal ID: ISSN 0013-936X
Country of Publication:
United States
Language:
English
Subject:
54 ENVIRONMENTAL SCIENCES; ORGANIC SILICON COMPOUNDS; ATMOSPHERIC CHEMISTRY; AMBIENT TEMPERATURE; CHEMICAL REACTION KINETICS; CHEMILUMINESCENCE; GAS CHROMATOGRAPHY; GASES; HYDROXYL RADICALS; LIFETIME; NITROGEN OXIDES; NITROUS ACID ESTERS; NITROXYL RADICALS; OZONE; PHOTOLYSIS; SILANES; SILOXANES; TEFLON; ULTRAVIOLET RADIATION; CHALCOGENIDES; CHEMICAL REACTIONS; CHEMISTRY; CHROMATOGRAPHY; DECOMPOSITION; ELECTROMAGNETIC RADIATION; ESTERS; FLUIDS; FLUORINATED ALIPHATIC HYDROCARBONS; HALOGENATED ALIPHATIC HYDROCARBONS; HYDRIDES; HYDROGEN COMPOUNDS; KINETICS; LUMINESCENCE; MATERIALS; NITROGEN COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PETROCHEMICALS; PETROLEUM PRODUCTS; PHOTOCHEMICAL REACTIONS; PLASTICS; POLY; POLYETHYLENES; POLYTETRAFLUOROETHYLENE; RADIATIONS; RADICALS; REACTION KINETICS; SEPARATION PROCESSES; SILICON COMPOUNDS; SYNTHETIC MATERIALS; 540120* - Environment, Atmospheric- Chemicals Monitoring & Transport- (1990-)

Citation Formats

Atkinson, R. Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO sub 3 radicals and O sub 3 at 297 + 2K. United States: N. p., 1991. Web. doi:10.1021/es00017a005.
Atkinson, R. Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO sub 3 radicals and O sub 3 at 297 + 2K. United States. https://doi.org/10.1021/es00017a005
Atkinson, R. Wed . "Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO sub 3 radicals and O sub 3 at 297 + 2K". United States. https://doi.org/10.1021/es00017a005.
@article{osti_5019780,
title = {Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO sub 3 radicals and O sub 3 at 297 + 2K},
author = {Atkinson, R},
abstractNote = {Rate constants for the gas-phase reactions of tetramethylsilane, hexamethyldisiloxane, hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, and decamethylcyclopentasiloxane with OH and NO{sub 3} radicals and O{sub 3} have been determined at 297 {plus minus} 2 K. The rate constants obtained for these OH radical, NO{sub 3} radical, and O{sub 3} reactions (in cm{sup 3} molecule{sup {minus}1} s{sup {minus}1} units), respectively, were as follows: for tetramethylsilane, 1.00 {times} 10{sup {minus}12}, < 8 {times} 10{sup {minus}17}, and < 7 {times} 10{sup {minus}21}; for hexamethyldisiloxane, 1.38 {times} 10{sup {minus}12}, < 8 {times} 10{sup {minus}17}, and < 7 {times} 10{sup {minus}21}; for hexamethylcyclotrisiloxane, 5.2 {times} 10{sup {minus}13}, < 2 {times} 10{sup {minus}16}, and < 3 {times} 10{sup {minus}20}; for octamethylcyclotetrasiloxane, 1.01 {times} 10{sup {minus}12}, < 2 {times} 10{sup {minus}16}, and < 3 {times} 10{sup {minus}20}, and for decamethylcyclopentasiloxane, 1.55 {times} 10{sup {minus}12}, < 3 {times} 10{sup {minus}16}, and < 3 {times} 10{sup {minus}20}. The NO{sub 3} radical and O{sub 3} reactions are calculated to be of no importance as tropospheric removal processes for these compounds. The calculated lifetimes of these volatile organosilicon compounds in the troposphere due to chemical reaction with the OH radical range from {approximately}10 days for decamethylcylopentasiloxane to {approximately}30 days for hexamethycylclotrisiloxane.},
doi = {10.1021/es00017a005},
url = {https://www.osti.gov/biblio/5019780}, journal = {Environmental Science and Technology; (United States)},
issn = {0013-936X},
number = ,
volume = 25:5,
place = {United States},
year = {1991},
month = {5}
}