Nanowear/nanomechanical testing and the role of stress in sputtered CN{sub x} overcoats
- Department of Metallurgical and Materials Engineering and The Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487-0202 (United States)
a:C{endash}N{sub x} films were deposited on Si(111) wafers at ambient temperatures by reactive magnetron sputtering of C in a mixed Ar/N{sub 2} discharge. The hardness (H) and elastic modulus (E) were assessed via nanoindentation using a Berkovich diamond indenter. The nitrogenated films exhibited increased hardness and elastic moduli values compared to the amorphous carbonated films, i.e., 25 and 240 GPa to 16 and 160 GPa, respectively. A sphere-on-flat (magnetic tape) wear tester was used to assess wear scar volume losses as a function of wear time. All films were in a state of compression (intrinsic and thermal stress). The bonding, composition, and structure of the films for all the deposition conditions were assessed by micro-Raman spectroscopy, energy dispersive x-ray spectroscopy (EDX), and x-ray diffraction (XRD), respectively, and subsequently correlated to overall film properties.{copyright} {ital 1997 American Institute of Physics.}
- OSTI ID:
- 496588
- Report Number(s):
- CONF-961141-; ISSN 0021-8979; TRN: 9709M0302
- Journal Information:
- Journal of Applied Physics, Vol. 81, Issue 8; Conference: 41. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 12-15 Nov 1996; Other Information: PBD: Apr 1997
- Country of Publication:
- United States
- Language:
- English
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