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Title: Nanowear/nanomechanical testing and the role of stress in sputtered CN{sub x} overcoats

Abstract

a:C{endash}N{sub x} films were deposited on Si(111) wafers at ambient temperatures by reactive magnetron sputtering of C in a mixed Ar/N{sub 2} discharge. The hardness (H) and elastic modulus (E) were assessed via nanoindentation using a Berkovich diamond indenter. The nitrogenated films exhibited increased hardness and elastic moduli values compared to the amorphous carbonated films, i.e., 25 and 240 GPa to 16 and 160 GPa, respectively. A sphere-on-flat (magnetic tape) wear tester was used to assess wear scar volume losses as a function of wear time. All films were in a state of compression (intrinsic and thermal stress). The bonding, composition, and structure of the films for all the deposition conditions were assessed by micro-Raman spectroscopy, energy dispersive x-ray spectroscopy (EDX), and x-ray diffraction (XRD), respectively, and subsequently correlated to overall film properties.{copyright} {ital 1997 American Institute of Physics.}

Authors:
; ;  [1]
  1. Department of Metallurgical and Materials Engineering and The Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487-0202 (United States)
Publication Date:
OSTI Identifier:
496588
Report Number(s):
CONF-961141-
Journal ID: JAPIAU; ISSN 0021-8979; TRN: 9709M0302
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 81; Journal Issue: 8; Conference: 41. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 12-15 Nov 1996; Other Information: PBD: Apr 1997
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON NITRIDES; MECHANICAL PROPERTIES; CARBON COMPOUNDS; PROTECTIVE COATINGS; RAMAN SPECTRA; CHEMICAL ANALYSIS; X-RAY DIFFRACTION; STRESSES; WEAR; SPUTTERING; HARDNESS; ELASTICITY; BONDING; CRYSTAL STRUCTURE

Citation Formats

Scharf, T W, Deng, H, and Barnard, J A. Nanowear/nanomechanical testing and the role of stress in sputtered CN{sub x} overcoats. United States: N. p., 1997. Web. doi:10.1063/1.365562.
Scharf, T W, Deng, H, & Barnard, J A. Nanowear/nanomechanical testing and the role of stress in sputtered CN{sub x} overcoats. United States. doi:10.1063/1.365562.
Scharf, T W, Deng, H, and Barnard, J A. Tue . "Nanowear/nanomechanical testing and the role of stress in sputtered CN{sub x} overcoats". United States. doi:10.1063/1.365562.
@article{osti_496588,
title = {Nanowear/nanomechanical testing and the role of stress in sputtered CN{sub x} overcoats},
author = {Scharf, T W and Deng, H and Barnard, J A},
abstractNote = {a:C{endash}N{sub x} films were deposited on Si(111) wafers at ambient temperatures by reactive magnetron sputtering of C in a mixed Ar/N{sub 2} discharge. The hardness (H) and elastic modulus (E) were assessed via nanoindentation using a Berkovich diamond indenter. The nitrogenated films exhibited increased hardness and elastic moduli values compared to the amorphous carbonated films, i.e., 25 and 240 GPa to 16 and 160 GPa, respectively. A sphere-on-flat (magnetic tape) wear tester was used to assess wear scar volume losses as a function of wear time. All films were in a state of compression (intrinsic and thermal stress). The bonding, composition, and structure of the films for all the deposition conditions were assessed by micro-Raman spectroscopy, energy dispersive x-ray spectroscopy (EDX), and x-ray diffraction (XRD), respectively, and subsequently correlated to overall film properties.{copyright} {ital 1997 American Institute of Physics.}},
doi = {10.1063/1.365562},
journal = {Journal of Applied Physics},
number = 8,
volume = 81,
place = {United States},
year = {1997},
month = {4}
}