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Title: Depth and temporal variations in water quality of the Snake River Plain aquifer in well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory

Abstract

In-situ measurements of the specific conductance and temperature of ground water in the Snake River Plain aquifer were collected in observation well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory. These parameters were monitored at various depths in the aquifer from October 1994 to August 1995. The specific conductance of ground water in well USGS-59, as measured in the borehole, ranged from about 450 to 900 {micro}S/cm at standard temperature (25 C). The pumping cycle of the production wells at the Idaho Chemical Processing Plant causes changes in borehole circulation patterns, and as a result the specific conductance of ground water at some depths in the well varies by up to 50% over a period of about 14 hours. However, these variations were not observed at all depths, or during each pumping cycle. The temperature of ground water in the well was typically between 12.8 and 13.8 C. The results of this study indicate that temporal variations in specific conductance of the ground water at this location are caused by an external stress on the aquifer--pumping of a production well approximately 4,000 feet away. These variations are believed to result from vertical stratificationmore » of water quality in the aquifer and a subsequent change in intrawell flow related to pumping. When sampling techniques that do not induce a stress on the aquifer (i.e., thief sampling) are used, knowledge of external stresses on the system at the time of sampling may aid in the interpretation of geochemical data.« less

Authors:
 [1];  [2]
  1. Idaho INEL Oversight Program, Boise, ID (United States)
  2. Univ. of Idaho, Moscow, ID (United States). Dept. of Geology and Geological Engineering
Publication Date:
Research Org.:
Idaho Univ., Moscow, ID (United States). Water Resources Research Inst.
Sponsoring Org.:
USDOE Office of Environmental Restoration and Waste Management, Washington, DC (United States)
OSTI Identifier:
486118
Report Number(s):
DOE/ID/13042-54
ON: DE97006429; TRN: 97:011320
DOE Contract Number:  
FG07-91ID13042
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: Mar 1997
Country of Publication:
United States
Language:
English
Subject:
05 NUCLEAR FUELS; 54 ENVIRONMENTAL SCIENCES; SNAKE RIVER PLAIN; WATER QUALITY; IDAHO NATIONAL ENGINEERING LABORATORY; ELECTRIC CONDUCTIVITY; TEMPERATURE MEASUREMENT; EXPERIMENTAL DATA; BOREHOLES; GROUND WATER; AQUIFERS

Citation Formats

Frederick, D.B., and Johnson, G.S. Depth and temporal variations in water quality of the Snake River Plain aquifer in well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory. United States: N. p., 1997. Web. doi:10.2172/486118.
Frederick, D.B., & Johnson, G.S. Depth and temporal variations in water quality of the Snake River Plain aquifer in well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory. United States. doi:10.2172/486118.
Frederick, D.B., and Johnson, G.S. Sat . "Depth and temporal variations in water quality of the Snake River Plain aquifer in well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory". United States. doi:10.2172/486118. https://www.osti.gov/servlets/purl/486118.
@article{osti_486118,
title = {Depth and temporal variations in water quality of the Snake River Plain aquifer in well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory},
author = {Frederick, D.B. and Johnson, G.S.},
abstractNote = {In-situ measurements of the specific conductance and temperature of ground water in the Snake River Plain aquifer were collected in observation well USGS-59 near the Idaho Chemical Processing Plant at the Idaho National Engineering and Environmental Laboratory. These parameters were monitored at various depths in the aquifer from October 1994 to August 1995. The specific conductance of ground water in well USGS-59, as measured in the borehole, ranged from about 450 to 900 {micro}S/cm at standard temperature (25 C). The pumping cycle of the production wells at the Idaho Chemical Processing Plant causes changes in borehole circulation patterns, and as a result the specific conductance of ground water at some depths in the well varies by up to 50% over a period of about 14 hours. However, these variations were not observed at all depths, or during each pumping cycle. The temperature of ground water in the well was typically between 12.8 and 13.8 C. The results of this study indicate that temporal variations in specific conductance of the ground water at this location are caused by an external stress on the aquifer--pumping of a production well approximately 4,000 feet away. These variations are believed to result from vertical stratification of water quality in the aquifer and a subsequent change in intrawell flow related to pumping. When sampling techniques that do not induce a stress on the aquifer (i.e., thief sampling) are used, knowledge of external stresses on the system at the time of sampling may aid in the interpretation of geochemical data.},
doi = {10.2172/486118},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {3}
}