METAL FILMS SPUTTERED AT LOW VOLTAGES.

Journal Article · Mon Jan 01 00:00:00 EST 1968 · J. Appl. Phys., 39: 5366-8(Nov. 1968).

DOI:https://doi.org/10.1063/1.1655983· OSTI ID:4831219

Lee, W W

• Research Organization: General Telephone and Electronics Labs., Inc., Bayside, N. Y.
• Sponsoring Organization: USDOE
• NSA Number: NSA-23-003051
• OSTI ID: 4831219
• Journal Information: J. Appl. Phys., 39: 5366-8(Nov. 1968)., Other Information: Orig. Receipt Date: 31-DEC-69
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

N30130* -Metals
Ceramics
& Other Materials-Metals & Alloys-Properties Evaluations
BISMUTH
CADMIUM
COPPER
ELECTRIC CONDUCTIVITY
FILMS
GOLD
HAFNIUM
IRON
METALLOGRAPHY
METALS
MICROSTRUCTURE
MOLYBDENUM
NIOBIUM
PLATINUM
SILVER
SPUTTERING
TANTALUM
TITANIUM
TUNGSTEN
TANTALUM/electric conductivity of films of
sputtered at low voltages
IRON/electric conductivity of films of
sputtered at low voltages
MOLYBDENUM/electric conductivity of films of
sputtered at low voltages
NIOBIUM/electric conductivity of films of
sputtered at low voltages
HAFNIUM/ electric conductivity of films of
sputtered at low voltages
GOLD/electric conductivity of films of
sputtered at low voltages
SILVER/electric conductivity of films of
sputtered at low voltages
COPPER/electric conductivity of films of
sputtered at low voltages
CADMIUM/electric conductivity of films of
sputtered at low voltages
METALLIC FILMS/electric conductivity of
sputtered at low voltages
TITANIUM/electric conductivity of films of
sputtered at low voltages
TUNGSTEN/electric conductivity of films of
sputtered at low voltages
BISMUTH/ electric conductivity of films of
sputtered at low voltages
PLATINUM/electric conductivity of films of
sputtered at low voltages