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Title: INFLUENCE OF IRRADIATION INTENSITY ON ACCUMULATION OF RADIATION DEFECTS IN SILICON.

Journal Article · · Sov. Phys.-Semicond. (Engl. Transl.) 5: No. 2, 300-1 (Aug 1971).
OSTI ID:4708489

Research Organization:
Inst. of Semiconductor Physics, Novosibirsk, USSR
NSA Number:
NSA-26-019571
OSTI ID:
4708489
Journal Information:
Sov. Phys.-Semicond. (Engl. Transl.) 5: No. 2, 300-1 (Aug 1971)., Other Information: Orig. Receipt Date: 31-DEC-72; Related Information: Translated from Fiz. Tekh. Poluprov.; 5: No. 2, 346-9(Feb 1971).
Country of Publication:
Country unknown/Code not available
Language:
English