REACTIVELY SPUTTERED TANTALUM THIN FILM RESISTORS. PART 1. PHYSICAL AND ELECTRICAL PROPERTIES.
Journal Article
·
· Thin Solid Films 8: No. 2, 81-100(Aug 1971).
- Research Organization:
- McMaster Univ., Hamilton, Ont.
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-26-003143
- OSTI ID:
- 4704858
- Journal Information:
- Thin Solid Films 8: No. 2, 81-100(Aug 1971)., Other Information: Orig. Receipt Date: 31-DEC-72
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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Related Subjects
N33120* -Physics (Solid State)-Physical Properties
N30150 -Metals
Ceramics
& Other Materials-Metals & Alloys-Radiation Effects
DOPED MATERIALS
ELECTRIC CONDUCTIVITY
ELECTRON MICROSCOPY
FILMS
HEAT TREATMENTS
MICROSTRUCTURE
NITROGEN
OXYGEN
RESISTORS
SPUTTERING
TANTALUM
TANTALUM OXIDES
RESISTORS/electric properties and structure of reactively sputtered tantalum thin-film
effects of heat treatment on
TANTALUM/ electric properties and structure of reactively sputtered thin-film resistors of
effects of heat treatment on
N30150 -Metals
Ceramics
& Other Materials-Metals & Alloys-Radiation Effects
DOPED MATERIALS
ELECTRIC CONDUCTIVITY
ELECTRON MICROSCOPY
FILMS
HEAT TREATMENTS
MICROSTRUCTURE
NITROGEN
OXYGEN
RESISTORS
SPUTTERING
TANTALUM
TANTALUM OXIDES
RESISTORS/electric properties and structure of reactively sputtered tantalum thin-film
effects of heat treatment on
TANTALUM/ electric properties and structure of reactively sputtered thin-film resistors of
effects of heat treatment on