Effect of thickness and annealing on stress in tantalum and tantalum nitride thin film hard coatings
- Univ. of Alabama, Tuscaloosa, AL (United States). Dept. of Metallurgical and Materials Engineering
An understanding of the relationship between stress and the other properties of thin films is extremely useful in the design of hard coatings for long term performance. In the authors` earlier study, sputtered Ta and Ta(N) films were found to exhibit promising hard coating properties. For example, nano hardness as high as 30 GPa was observed in the nitride (pN{sub 2} = 0.100 mTorr) films. In this work, they study the variation in the stress in these films with respect to film thickness and annealing. Films in six different thicknesses (50, 250, 350, 500, 750, and 1,000 nm) were deposited on oxide coated Si(111) wafers. Stresses in the films in the as-deposited state and as a function of temperature (300 C) were determined using a thin film stress measuring unit.
- OSTI ID:
- 467639
- Report Number(s):
- CONF-960401-; ISBN 1-55899-339-8; TRN: 97:008311
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 8-12 Apr 1996; Other Information: PBD: 1997; Related Information: Is Part Of Thin films: Stresses and mechanical properties VI; Gerberich, W.W. [ed.] [Univ. of Minnesota, Minneapolis, MN (United States)]; Gao, H. [ed.] [Stanford Univ., CA (United States)]; Sundgren, J.E. [ed.] [Linkoeping Univ. (Sweden)]; Baker, S.P. [ed.] [Max-Planck-Inst. fuer Metallforschung, Stuttgart (Germany)]; PB: 559 p.; Materials Research Society symposium proceedings, Volume 436
- Country of Publication:
- United States
- Language:
- English
Similar Records
Nanostructure formation during deposition of TiN/SiN{sub x} nanomultilayer films by reactive dual magnetron sputtering
The synthesis, characterization, and mechanical properties of thick, ultrahard cubic boron nitride films deposited by ion-assisted sputtering