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Title: Characterization of the mechanical and tribological properties of sputtered a:SiC thin films

Abstract

D.C. magnetron sputtering from a CVD {beta}-SiC target has been utilized to deposit amorphous SiC thin films on various substrates (Corning 7059 glass, unoxidized Si (111), and sapphire). The approximately 1 {micro}m thick films were grown under various Ar sputtering pressures and flow rates. In situ annealing during deposition in vacuum and ex situ post-deposition annealing in air, both at 500 C for two hours, were implemented to determine their effects on the properties of the films. The mechanical properties were assessed via nanoindentation. An accelerated sphere-on-flat(tape) wear tester was administered to measure the wear volume losses and resultant wear rates under 0.1 and 0.2N loads, a 0.024 m/s tape speed, and a 1 mm ruby sphere diameter. An atomic force microscope (AFM) established the wear scar volume losses as well as the surface arithmetic roughness (R{sub A}) and root mean square roughness (RMS) of the films. The amorphous microstructure was verified by X-ray diffractometry. There was a decreasing trend in the plastic contact damage resistance, hardness, elastic modulus, and wear resistance of the films with increased amounts of Ar gas pressure; on the other hand, annealing of the lower Ar content films generated an increase in these properties comparedmore » to the as-deposited films. Atomic force microscopy revealed a more pronounced change in surface features and roughness for the in situ annealed films.« less

Authors:
; ;  [1]
  1. Univ. of Alabama, Tuscaloosa, AL (United States). Dept. of Metallurgical and Materials Engineering
Publication Date:
Sponsoring Org.:
National Science Foundation, Washington, DC (United States)
OSTI Identifier:
467615
Report Number(s):
CONF-960401-
ISBN 1-55899-339-8; TRN: IM9721%%43
Resource Type:
Book
Resource Relation:
Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 8-12 Apr 1996; Other Information: PBD: 1997; Related Information: Is Part Of Thin films: Stresses and mechanical properties VI; Gerberich, W.W. [ed.] [Univ. of Minnesota, Minneapolis, MN (United States)]; Gao, H. [ed.] [Stanford Univ., CA (United States)]; Sundgren, J.E. [ed.] [Linkoeping Univ. (Sweden)]; Baker, S.P. [ed.] [Max-Planck-Inst. fuer Metallforschung, Stuttgart (Germany)]; PB: 559 p.; Materials Research Society symposium proceedings, Volume 436
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; PHYSICAL VAPOR DEPOSITION; MICROSTRUCTURE; MECHANICAL PROPERTIES; SILICON CARBIDES; SUBSTRATES; SILICON; ALUMINIUM OXIDES; AMORPHOUS STATE; THIN FILMS; WEAR RESISTANCE; ROUGHNESS; HARDNESS; YOUNG MODULUS; ANNEALING; EXPERIMENTAL DATA

Citation Formats

Scharf, T W, Inturi, R B, and Barnard, J A. Characterization of the mechanical and tribological properties of sputtered a:SiC thin films. United States: N. p., 1997. Web.
Scharf, T W, Inturi, R B, & Barnard, J A. Characterization of the mechanical and tribological properties of sputtered a:SiC thin films. United States.
Scharf, T W, Inturi, R B, and Barnard, J A. Thu . "Characterization of the mechanical and tribological properties of sputtered a:SiC thin films". United States.
@article{osti_467615,
title = {Characterization of the mechanical and tribological properties of sputtered a:SiC thin films},
author = {Scharf, T W and Inturi, R B and Barnard, J A},
abstractNote = {D.C. magnetron sputtering from a CVD {beta}-SiC target has been utilized to deposit amorphous SiC thin films on various substrates (Corning 7059 glass, unoxidized Si (111), and sapphire). The approximately 1 {micro}m thick films were grown under various Ar sputtering pressures and flow rates. In situ annealing during deposition in vacuum and ex situ post-deposition annealing in air, both at 500 C for two hours, were implemented to determine their effects on the properties of the films. The mechanical properties were assessed via nanoindentation. An accelerated sphere-on-flat(tape) wear tester was administered to measure the wear volume losses and resultant wear rates under 0.1 and 0.2N loads, a 0.024 m/s tape speed, and a 1 mm ruby sphere diameter. An atomic force microscope (AFM) established the wear scar volume losses as well as the surface arithmetic roughness (R{sub A}) and root mean square roughness (RMS) of the films. The amorphous microstructure was verified by X-ray diffractometry. There was a decreasing trend in the plastic contact damage resistance, hardness, elastic modulus, and wear resistance of the films with increased amounts of Ar gas pressure; on the other hand, annealing of the lower Ar content films generated an increase in these properties compared to the as-deposited films. Atomic force microscopy revealed a more pronounced change in surface features and roughness for the in situ annealed films.},
doi = {},
url = {https://www.osti.gov/biblio/467615}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {5}
}

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