Optimization of multilayer reflectivity and bandpass for soft to hard x-ray applications [0.1{endash}200 keV]
- European Synchrotron Radiation Facility, BP 220, F-38043 Grenoble Cedex (France)
In the last decades, the major motivation for manufacturing multilayer mirrors has been in soft x-ray applications, particularly for astronomy, microlithography, and polarimetry. The advent of high energy synchrotron storage rings has provided a new significant impetus emphasizing high energy applications and especially when flux, rather than resolution, is desired. In this paper we present the reflection properties of the most promising multilayer material combinations for the energy range from 0.1 keV up to 200 keV. Previous calculations by Rosenbluth were limited to a maximum of 2 keV and to multilayers composed of pure elements and operating under normal incidence. As alloys might be essential for a smooth growth and/or for stability under high heat load, our screening consisted of a list of up to 300 solids having a melting point above 100{degree}C and that could be deposited in a sputtering process. A full computer search calculates 45000 multilayer combinations for each angle (or multilayer d-spacing) and energy of operation, the only necessary input variables. Other manufacture-related parameters can be specified to give a more realistic picture of the performance. As the number of layers is often limited, a nonperiodic design could minimize absorption effects. {copyright} {ital 1996 American Institute of Physics.}
- OSTI ID:
- 434763
- Report Number(s):
- CONF-9510119-; ISSN 0034-6748; TRN: 97:003786
- Journal Information:
- Review of Scientific Instruments, Vol. 67, Issue 9; Conference: SRI `95: synchrotron radiation instrumentation symposium and the 7. users meeting for the advanced photon source (APS), Argonne, IL (United States), 16-20 Oct 1995; Other Information: PBD: Sep 1996
- Country of Publication:
- United States
- Language:
- English
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