skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Accurate pattern registration for integrated circuit tomography

Abstract

As part of an effort to develop high resolution microtomography for engineered structures, a two-level copper integrated circuit interconnect was imaged using 1.83 keV x rays at 14 angles employing a full-field Fresnel zone plate microscope. A major requirement for high resolution microtomography is the accurate registration of the reference axes in each of the many views needed for a reconstruction. A reconstruction with 100 nm resolution would require registration accuracy of 30 nm or better. This work demonstrates that even images that have strong interference fringes can be used to obtain accurate fiducials through the use of Radon transforms. We show that we are able to locate the coordinates of the rectilinear circuit patterns to 28 nm. The procedure is validated by agreement between an x-ray parallax measurement of 1.41{+-}0.17 {mu}m and a measurement of 1.58{+-}0.08 {mu}m from a scanning electron microscope image of a cross section.

Authors:
; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
(US)
OSTI Identifier:
40277907
DOE Contract Number:  
W-31-109-ENG-38
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 90; Journal Issue: 2; Other Information: DOI: 10.1063/1.1381541; Othernumber: JAPIAU000090000002000556000001; 045115JAP; PBD: 15 Jul 2001; Journal ID: ISSN 0021-8979
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ACCURACY; COPPER; CROSS SECTIONS; ELECTRON MICROSCOPES; INTEGRATED CIRCUITS; RADON; RESOLUTION; TOMOGRAPHY

Citation Formats

Levine, Zachary H, Grantham, Steven, Neogi, Suneeta, Frigo, Sean P, McNulty, Ian, Retsch, Cornelia C, Wang, Yuxin, and Lucatorto, Thomas B. Accurate pattern registration for integrated circuit tomography. United States: N. p., 2001. Web. doi:10.1063/1.1381541.
Levine, Zachary H, Grantham, Steven, Neogi, Suneeta, Frigo, Sean P, McNulty, Ian, Retsch, Cornelia C, Wang, Yuxin, & Lucatorto, Thomas B. Accurate pattern registration for integrated circuit tomography. United States. doi:10.1063/1.1381541.
Levine, Zachary H, Grantham, Steven, Neogi, Suneeta, Frigo, Sean P, McNulty, Ian, Retsch, Cornelia C, Wang, Yuxin, and Lucatorto, Thomas B. Sun . "Accurate pattern registration for integrated circuit tomography". United States. doi:10.1063/1.1381541.
@article{osti_40277907,
title = {Accurate pattern registration for integrated circuit tomography},
author = {Levine, Zachary H and Grantham, Steven and Neogi, Suneeta and Frigo, Sean P and McNulty, Ian and Retsch, Cornelia C and Wang, Yuxin and Lucatorto, Thomas B},
abstractNote = {As part of an effort to develop high resolution microtomography for engineered structures, a two-level copper integrated circuit interconnect was imaged using 1.83 keV x rays at 14 angles employing a full-field Fresnel zone plate microscope. A major requirement for high resolution microtomography is the accurate registration of the reference axes in each of the many views needed for a reconstruction. A reconstruction with 100 nm resolution would require registration accuracy of 30 nm or better. This work demonstrates that even images that have strong interference fringes can be used to obtain accurate fiducials through the use of Radon transforms. We show that we are able to locate the coordinates of the rectilinear circuit patterns to 28 nm. The procedure is validated by agreement between an x-ray parallax measurement of 1.41{+-}0.17 {mu}m and a measurement of 1.58{+-}0.08 {mu}m from a scanning electron microscope image of a cross section.},
doi = {10.1063/1.1381541},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 2,
volume = 90,
place = {United States},
year = {2001},
month = {7}
}