High-transmittance surface textures formed by plasma etching of metallophthalocyanine films
Journal Article
·
· Journal of Applied Physics
The effect of rf-induced plasma etching on thermally evaporated metallophthalocyanine films is investigated. Etching by a gas mixture of nitrogen and CF{sub 4} results in a transparent microstructuring residue with a grain size in the 100 nm range. The residue-covered surface increases visible transmittance up to 3%{endash}4% over the glass substrate. The high-transmittance effect, which is nearly insensitive to wavelength, is characterized by modeling a gradient refractive-index profile bounded on discrete interfaces with surrounding media. {copyright} 2001 American Institute of Physics.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40204168
- Journal Information:
- Journal of Applied Physics, Vol. 89, Issue 12; Other Information: DOI: 10.1063/1.1371950; Othernumber: JAPIAU000089000012007711000001; 075112JAP; PBD: 15 Jun 2001; ISSN 0021-8979
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
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