Structural study of nanometric electrodeposited Co films using {sup 59}Co NMR
A {sup 59}Co NMR experiment has been used to investigate the structure of two series of Co films with thicknesses varying from 5 to 400 nm which were electrodeposited on Cu at the electrolyte pH value of 2.1 and 3.7, respectively. It was shown that the overall structure of studied Co films consists of a very good quality fcc phase and a heavily faulted hcp phase in about equal proportions. The exceptions are very thin Co layers (below 20 nm) where the hcp structure was stabilized at pH 3.7 and overpotential of 0.9 V. This effect is attributed to the formation of hexagonal cobalt hydroxide in the early stage of deposition, which acts as a buffer layer stabilizing Co hcp structure. {copyright} 2001 American Institute of Physics.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40203966
- Journal Information:
- Journal of Applied Physics, Vol. 89, Issue 11; Other Information: DOI: 10.1063/1.1354582; Othernumber: JAPIAU000089000011007083000001; 155111MMM; PBD: 1 Jun 2001; ISSN 0021-8979
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
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