Precision optical aspheres for extreme ultraviolet lithography

Journal Article · Fri Nov 01 00:00:00 EST 1996 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.588652· OSTI ID:399788

Kania, D R; Gaines, D P; Sweeney, D S; Sommargren, G E; Fontaine, B L; Vernon, S P ^[1]; Tichenor, D A; Bjorkholm, J E; Zernike, F ^[2]; Kestner, R N ^[3]

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1. Advanced Microtechnology Program, Lawrence Livermore National Laboratory, Livermore, California 94551 (United States)
2. Sandia National Laboratories, Livermore, California 94551 (United States)
3. Tinsley Laboratories, Richmond, California 94806 (United States)

We have demonstrated significant advances in the production of aspheric optics for extreme ultraviolet lithography. An optic has been fabricated with an aspheric departure of 1.5 {mu}m, a figure error of 0.7 nm rms, and a nanoroughness of 0.25 nm rms. Further improvements are required in the figure and nanoroughness to reach high throughput and near diffraction limited performance in an extreme ultraviolet lithography system. {copyright} {ital 1996 American Vacuum Society}

• OSTI ID: 399788
• Report Number(s): CONF-960582-; ISSN 0734-211X; TRN: 9623M0061
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 14, Issue 6; Conference: 40. international conference on electron, ion and photon beam technology and nanofabrication, Atlanta, GA (United States), 28-31 May 1996; Other Information: PBD: Nov 1996
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
OPTICAL SYSTEMS
EXTREME ULTRAVIOLET RADIATION
ACCURACY
APERTURES
IMAGES
SPATIAL RESOLUTION
OPTIC
LITHOGRAPHY