Uniform deposition of YBa{sub 2}Cu{sub 3}O{sub 7} thin films over an 8 inch diameter area by a 90{degree} off-axis sputtering technique
- Department of Mechanical Engineering and Materials Science, Duke University, Durham, North Carolina 27708 (United States)
- Lucent Technologies, Bell Laboratories, Murray Hill, New Jersey 07974 (United States)
- Department of Physics, University of Virginia, Charlottesville, Virginia 22903 (United States)
The uniform deposition of YBa{sub 2}Cu{sub 3}O{sub 7} (YBCO) thin films over an 8-in.-diam. area, using a 3-in.-diam. sputtering target and optimized substrate rotation in a single target 90{degree} off-axis sputtering technique, is reported. Two dimensional maps of the thickness profile of YBCO films deposited on a stationary substrate have been obtained using surface profilometry. These thicknesses were used in a computer simulation to predict which distance of the target from the center of the substrate rotation will produce the maximum area with uniform thickness. The films deposited on substrates mounted on a rotating arm displayed uniform thickness ({lt}{plus_minus}5{percent} variation) and composition ({lt}2.3{percent} deviation from the target stoichiometry) and a consistently high transition temperature ({ital T}{sub {ital c}}{gt}87.5{degree} K) and critical current density ({ital J}{sub {ital c}4.2 K}{gt}2{times}10{sup 7} A/cm{sup 2}) over an 8-in.-diam area. {copyright} {ital 1996 American Institute of Physics.}
- OSTI ID:
- 399762
- Journal Information:
- Applied Physics Letters, Vol. 69, Issue 25; Other Information: PBD: Dec 1996
- Country of Publication:
- United States
- Language:
- English
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