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Title: Sandia/SEMATECH Contamination Free Manufacturing Research Center, novel sensor development activities for enhanced process control

Conference ·
OSTI ID:397097
 [1];  [2]
  1. SEMATECH, Austin, TX (United States)
  2. Sandia National Labs., Albuquerque, NM (United States)

The Sandia/SEMATECH Contamination Free Manufacturing Research Center (CFMRC) was founded in 1992 with the goal of providing research and development support to the U.S. semiconductor industry in the area of defect reduction in manufacturing equipment and processes. The program encompasses topics in equipment/process contamination modeling, advanced wafer cleaning, water use reduction, organic contamination, wafer- map defect data analysis and contamination sensor development. The Contamination Sensor development activity focuses on producing advanced tools for the semiconductor industry by development and commercialization of in-line cost-effective sensors for measurement of contaminants in critical process tools. There are three phases to the CFMRC sensor development activities. Initially, efforts focus on sensor feasibility testing whereby several potential sensors are evaluated for technical and business issues such as sensitivity, reproducibility, cost, size, etc. After this initial screening, subsequent refinement of one or more chosen sensors occurs through beta-testing in a manufacturing environment to ensure viability for manufacturing applications. Lastly, commercialization with an existing supplier is critical in ensuring availability of the sensors for the industry. The examples described in this paper cover sensor development at all three stages in this evolutionary process.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
397097
Report Number(s):
SAND-96-2557C; CONF-961002-3; ON: DE97000729
Resource Relation:
Conference: 43. national symposium of the American Vacuum Society (AVS), Philadelphia, PA (United States), 14-18 Oct 1996; Other Information: PBD: [1996]
Country of Publication:
United States
Language:
English