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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

Abstract

An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.

Inventors:
; ;
Publication Date:
Research Org.:
Affymax Research Inst
OSTI Identifier:
392648
Patent Number(s):
US 5,571,639/A/
Application Number:
PAN: 8-249,188; CNN: Contract H600813-1;Contract H600813-2
Assignee:
Affymax Technologies N.V., Curaco (Netherlands Antilles)
DOE Contract Number:  
FG03-92ER81275
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 5 Nov 1996
Country of Publication:
United States
Language:
English
Subject:
99 MATHEMATICS, COMPUTERS, INFORMATION SCIENCE, MANAGEMENT, LAW, MISCELLANEOUS; 55 BIOLOGY AND MEDICINE, BASIC STUDIES; 36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; COMPUTER-AIDED DESIGN; DNA; INTEGRATED CIRCUITS; MASKING; POLYMERS; FABRICATION

Citation Formats

Hubbell, E A, Morris, M S, and Winkler, J L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1996. Web.
Hubbell, E A, Morris, M S, & Winkler, J L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, E A, Morris, M S, and Winkler, J L. Tue . "Computer-aided engineering system for design of sequence arrays and lithographic masks". United States.
@article{osti_392648,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, E A and Morris, M S and Winkler, J L},
abstractNote = {An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {11}
}