Propenyl ether monomers for photopolymerization
Propenyl ether monomers of formula A(OCH{double_bond}CHCH{sub 3}){sub n} wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of the above formula together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.
- Research Organization:
- Rensselaer Polytechnic Inst
- DOE Contract Number:
- FG02-91ER12117
- Assignee:
- Rensselaer Polytechnic Inst., Troy, NY (United States)
- Patent Number(s):
- US 5,567,858/A/
- Application Number:
- PAN: 8-571,200
- OSTI ID:
- 392639
- Resource Relation:
- Other Information: PBD: 22 Oct 1996
- Country of Publication:
- United States
- Language:
- English
Similar Records
Propenyl ether monomers for photopolymerization
Process for making propenyl ethers and photopolymerizable compositions containing them