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Title: Epitaxial growth and physical properties of La{sub 1{minus}x}Ca{sub x}MnO{sub 3{minus}{delta}} thin films on MgO(001) substrates

Book ·
OSTI ID:392198
; ;  [1]; ; ;  [2]
  1. Seoul National Univ. (Korea, Republic of)
  2. LG Electronics Research Center, Seoul (Korea, Republic of)

Perovskite La{sub 1{minus}x}Ca{sub x}MnO{sub 3{minus}{delta}} (LCMO) thin films with a wide range of x, i.e., 0.0 {le} x {le} 0.6, were deposited on MgO(001) substrates using a pulsed laser deposition (PLD) technique. Epitaxial La{sub 0.7}Ca{sub 0.3}MnO{sub 3{minus}{delta}}/MgO thin films were able to be grown under a condition such as 1.5--2.1 J/cm{sup 2} of a laser fluence, 650--750 C of a substrate temperature, and 100--300 mtorr of an oxygen pressure. X-ray pole figures and electron diffraction pattern showed that the LCMO films were grown epitaxially on MgO(001). Rutherford Backscattering Spectroscopy measurements investigated that the epitaxial LCMO films have compositions similar to those of targets, demonstrating the PLD is a useful technique to get films with complicated chemical compositions. Various physical properties, including resistance, R, magnetoresistance, {Delta}R/R(H = 0) {triple_bond} (R(H)-R(0))/R(0), and magnetization, M(T), were measured. The LCMO thin films with 0.2 {le} x {le} 0.5 had both semiconductor-metal and ferromagnetic ordering transitions, whose temperatures are located close to each other. These physical properties were explained in terms of the magnetic polaron model.

OSTI ID:
392198
Report Number(s):
CONF-951155-; ISBN 1-55899-304-5; TRN: IM9647%%52
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Epitaxial oxide thin films 2; Speck, J.S. [ed.] [Univ. of California, Santa Barbara, CA (United States)]; Fork, D.K. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Wolf, R.M. [ed.] [Philips Research Labs., Briarcliff Manor, NY (United States)]; Shiosaki, Tadashi [ed.] [Kyoto Univ. (Japan)]; PB: 577 p.; Materials Research Society symposium proceedings, Volume 401
Country of Publication:
United States
Language:
English