skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: The structure and electric field dependent dielectric properties of annealed Sr{sub 1{minus}x}Ba{sub x}TiO{sub 3} ferroelectric thin films

Book ·
OSTI ID:392164
; ; ;  [1]; ;  [2]
  1. Naval Research Lab., Washington, DC (United States)
  2. SCT, Golden, CO (United States)

The effect of a post deposition anneal on the structure and dielectric properties of epitaxial Sr{sub 1{minus}x}Ba{sub x}TiO{sub 3} (SBT) thin films with x = 0.35, 0.50 and 0.60 has been measured. The films were grown by pulsed laser deposition on LaAlO{sub 3} (001) substrates at 750 C in 350 mTorr of oxygen. The as-deposited films were single phase, (00{ell}) oriented with {omega}-scan widths for the (002) reflection between 0.16{degree} and 0.50{degree}. The dielectric properties of the as-deposited films exhibit a broad temperature dependence and a peak which is as much as 50 K below the peak in bulk SBT. Also, the lattice parameter, as measured by x-ray diffraction, of the as-deposited films was larger than the bulk indicating strain in the films. The as-deposited films were annealed for 8 hours at 900 C in oxygen. The dielectric properties of the annealed films were closer to that of bulk SBT and the lattice parameter was closer to the bulk lattice parameter indicating a reduction of strain. Annealing of as-deposited films also resulted in an increased dielectric tuning without increased dielectric loss.

OSTI ID:
392164
Report Number(s):
CONF-951155-; ISBN 1-55899-304-5; TRN: IM9647%%18
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Epitaxial oxide thin films 2; Speck, J.S. [ed.] [Univ. of California, Santa Barbara, CA (United States)]; Fork, D.K. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Wolf, R.M. [ed.] [Philips Research Labs., Briarcliff Manor, NY (United States)]; Shiosaki, Tadashi [ed.] [Kyoto Univ. (Japan)]; PB: 577 p.; Materials Research Society symposium proceedings, Volume 401
Country of Publication:
United States
Language:
English