skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Epitaxial growth and characterization of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile films by oxygen-plasma-assisted molecular beam epitaxy

Abstract

Epitaxial films of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile were grown on TiO{sub 2} (110) and (100) at 600 C by oxygen-plasma-assisted molecular beam epitaxy using elemental Ti and Nb sources. The epitaxial films were characterized by means of reflection high-energy and low-energy electron diffraction (RHEED/LEED), x-ray photoelectron spectroscopy and diffraction (XPS/XPD), ultraviolet photoemission spectroscopy (UPS) and atomic force microscopy (AFM). The epitaxial films grow in a layer-by-layer fashion and have excellent short- and long-range structure order at x {le} 0.3 on TiO{sub 2} (110) and at x {le} 0.15 on TiO{sub 2} (100). However, the epitaxial films become rough and disorder at higher doping levels. Nb substitutionally incorporates at cation lattice sites, leading to Nb{sub x}Ti{sub 1{minus}x}O{sub 21} solid solutions. In addition, the oxidation state of Nb in the Nb{sub x}Ti{sub 1{minus}x}O{sub 2} films has been determined to be +4.

Authors:
;  [1]
  1. Pacific Northwest National Lab., Richland, WA (United States). Environmental Molecular Sciences Lab.
Publication Date:
OSTI Identifier:
392154
Report Number(s):
CONF-951155-
ISBN 1-55899-304-5; TRN: 96:028525
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Book
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Epitaxial oxide thin films 2; Speck, J.S. [ed.] [Univ. of California, Santa Barbara, CA (United States)]; Fork, D.K. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Wolf, R.M. [ed.] [Philips Research Labs., Briarcliff Manor, NY (United States)]; Shiosaki, Tadashi [ed.] [Kyoto Univ. (Japan)]; PB: 577 p.; Materials Research Society symposium proceedings, Volume 401
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; NIOBIUM OXIDES; SPUTTERING; CRYSTAL STRUCTURE; TITANIUM OXIDES; LAYERS; ELECTRON DIFFRACTION; PHOTOELECTRON SPECTROSCOPY; X-RAY DIFFRACTION; MICROSCOPY; SOLID SOLUTIONS; ELECTRON BEAMS; BINDING ENERGY; CHEMICAL COMPOSITION; VALENCE; EXPERIMENTAL DATA

Citation Formats

Gao, Y, and Chambers, S A. Epitaxial growth and characterization of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile films by oxygen-plasma-assisted molecular beam epitaxy. United States: N. p., 1996. Web.
Gao, Y, & Chambers, S A. Epitaxial growth and characterization of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile films by oxygen-plasma-assisted molecular beam epitaxy. United States.
Gao, Y, and Chambers, S A. 1996. "Epitaxial growth and characterization of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile films by oxygen-plasma-assisted molecular beam epitaxy". United States.
@article{osti_392154,
title = {Epitaxial growth and characterization of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile films by oxygen-plasma-assisted molecular beam epitaxy},
author = {Gao, Y and Chambers, S A},
abstractNote = {Epitaxial films of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile were grown on TiO{sub 2} (110) and (100) at 600 C by oxygen-plasma-assisted molecular beam epitaxy using elemental Ti and Nb sources. The epitaxial films were characterized by means of reflection high-energy and low-energy electron diffraction (RHEED/LEED), x-ray photoelectron spectroscopy and diffraction (XPS/XPD), ultraviolet photoemission spectroscopy (UPS) and atomic force microscopy (AFM). The epitaxial films grow in a layer-by-layer fashion and have excellent short- and long-range structure order at x {le} 0.3 on TiO{sub 2} (110) and at x {le} 0.15 on TiO{sub 2} (100). However, the epitaxial films become rough and disorder at higher doping levels. Nb substitutionally incorporates at cation lattice sites, leading to Nb{sub x}Ti{sub 1{minus}x}O{sub 21} solid solutions. In addition, the oxidation state of Nb in the Nb{sub x}Ti{sub 1{minus}x}O{sub 2} films has been determined to be +4.},
doi = {},
url = {https://www.osti.gov/biblio/392154}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {11}
}

Book:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this book.

Save / Share: