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Title: A high-temperature x-ray-diffraction study of epitaxial PbTiO{sub 3} thin films on MgO(100) grown by metal-organic chemical-vapor deposition

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.363700· OSTI ID:389265
; ; ;  [1];  [2];  [3]
  1. Department of Materials Science and Engineering and Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
  2. Nippon Steel Corporation, Kawasaki (Japan)
  3. Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60493 (United States)

Epitaxial lead titanate (PbTiO{sub 3}) thin films were grown on MgO(100) single-crystal substrate by metal-organic chemical-vapor deposition at a growth temperature of 650{degree}C. The films were dense, stoichiometric, and epitaxial. The domain structure was studied via x-ray-diffraction {omega} scans and in-plane {Phi} scans. Existence of {ital c} and {ital a} domains in the PbTiO{sub 3} films was evident. Consistent with literature reports, the {ital a} domains were found to have four variants 90{degree} apart from each other, tilting about 2.2{degree} away from the surface normal. The population ratio between {ital c} and {ital a} domain of the PbTiO{sub 3} films was determined to be approximately 2.3 to 1. The domain structure was found to be stable and reproducible during repeated thermal cycling above and below {ital T}{sub {ital c}}. Furthermore, lattice parameters and Curie temperatures of PbTiO{sub 3} thin films were measured during the thermal cycles. The lattice parameters were found to be smaller and the Curie temperatures were shifted lower than the corresponding bulk values. This is attributed to the film stress effect. A theory based on the Landau{endash}Ginzburg{endash}Devonshire function has been developed to explain the shift of the Curie temperatures. {copyright} {ital 1996 American Institute of Physics.}

Research Organization:
Univ. of Illinois at Urbana-Champaign, IL (United States)
DOE Contract Number:
FG02-91ER45439
OSTI ID:
389265
Journal Information:
Journal of Applied Physics, Vol. 80, Issue 11; Other Information: PBD: Dec 1996
Country of Publication:
United States
Language:
English

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