Plasma distribution of cathodic ARC deposition system

Conference · Thu Aug 01 00:00:00 EDT 1996

DOI:https://doi.org/10.1063/1.361523· OSTI ID:387461

Anders, S; Raoux, S; Krishnan, K; MacGill, R A; Brown, I G ^[1]

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1. Lawrence Berkeley National Lab., CA (United States)

The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 387461
• Report Number(s): LBNL-38845; CONF-9509356-; ON: DE96014963; TRN: 96:027269
• Resource Relation: Journal Volume: 79; Journal Issue: 9; Conference: Workshop on vacuum arc ion sources, Berkeley, CA (United States), 18-20 Sep 1995; Other Information: PBD: Aug 1996; Related Information: Is Part Of Proceedings of the workshop on vacuum arc ion sources; Brown, I. [ed.]; PB: 142 p.
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
ION SOURCES
BEAM PROFILES
PLASMA
SPATIAL DISTRIBUTION
ELECTRIC ARCS
CATHODE SPUTTERING