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Title: Modeling experiments on continuous microwave processing of thermal runaway materials

Conference ·
OSTI ID:343604
; ; ;  [1];  [2]
  1. Virginia Polytechnic Inst. and State Univ., Blacksburg, VA (United States)
  2. Los Alamos National Lab., NM (United States)

Microwave processing of metal oxide ceramic fibers offers several potential advantages. However, work so far has revealed several difficult problems; typically, these materials have very low dielectric loss coefficients at room temperature which increase rapidly with temperature. Although microwave heating of such low-loss materials can be accomplished by using high field strengths in high-Q applicators, this approach usually fails because of thermal runaway. The authors seek to demonstrate that custom designed microwave applicators can overcome the problem of thermal runaway and produce heating patterns which lead to temperature profiles tailored to specific processing objectives. The first step is to develop a verified model of the electromagnetic and temperature fields in an applicator and load. The authors report results from experiments on well-characterized ceramic rods and a heat transfer model of the experiments which assumes uniform electromagnetic fields. A 2-D thermal model of the experiments was developed using the implicit finite-difference technique with temperature-dependent properties. This model gives results in good qualitative agreement with the measured temperatures. These results lead to three useful conclusions: (1) thermal runaway can be avoided by controlling the power absorbed by the sample; (2) conduction along the length of a microwave-heated rod, along with convection and radiation from the surface, can lead to fairly localized hot spots in a small cavity, even with uniform fields; and (3) the difference between forward and reflected power to the cavity is an overestimate of the power absorbed by the load, suggesting that there were significant losses in the cavity walls.

OSTI ID:
343604
Report Number(s):
CONF-980601-; TRN: IM9921%%67
Resource Relation:
Conference: 25. international conference on plasma science, Raleigh, NC (United States), 1-4 Jun 1998; Other Information: PBD: 1998; Related Information: Is Part Of IEEE conference record -- Abstracts. 1998 IEEE international conference on plasma science; PB: 343 p.
Country of Publication:
United States
Language:
English

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