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Title: Evaluation of boron-doped beryllium as an ablator for NIF target capsules

Abstract

The authors are studying the feasibility of using boron doping to refine the grain structure of sputter-deposited Be for NIF ignition capsule ablators. The goal is to improve the surface finish and homogeneity of these coatings. Films deposited on flat silicon substrates display a pronounced change in structure at a concentration of {approximately}11 at.% B. At lower levels of B, grain sizes of about 100 nm are observed. AFM images show the roughness of these films to be about 20 nm rms. Films deposited on capsules do not show the same behavior. In particular, at 15 at.% B, the capsule coatings have nodular structure with an rms roughness of greater than 50 nm. When viewed in cross section, however, no structure is seen with either the flat films or the capsule coatings. They believe that differences in substrate temperature may be largely responsible for the observed behavior.

Authors:
;  [1]
  1. Lawrence Livermore National Lab., CA (United States)
Publication Date:
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
328356
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Journal Article
Journal Name:
Fusion Technology
Additional Journal Information:
Journal Volume: 35; Journal Issue: 2; Other Information: PBD: Mar 1999
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION; 36 MATERIALS SCIENCE; US NATIONAL IGNITION FACILITY; ABLATION; DESIGN; LASER TARGETS; THERMONUCLEAR FUELS; FEASIBILITY STUDIES; BORON ALLOYS; BERYLLIUM ALLOYS; METALLURGICAL EFFECTS; MICROSTRUCTURE; ROUGHNESS

Citation Formats

McEachern, R., and Alford, C. Evaluation of boron-doped beryllium as an ablator for NIF target capsules. United States: N. p., 1999. Web.
McEachern, R., & Alford, C. Evaluation of boron-doped beryllium as an ablator for NIF target capsules. United States.
McEachern, R., and Alford, C. Mon . "Evaluation of boron-doped beryllium as an ablator for NIF target capsules". United States.
@article{osti_328356,
title = {Evaluation of boron-doped beryllium as an ablator for NIF target capsules},
author = {McEachern, R. and Alford, C.},
abstractNote = {The authors are studying the feasibility of using boron doping to refine the grain structure of sputter-deposited Be for NIF ignition capsule ablators. The goal is to improve the surface finish and homogeneity of these coatings. Films deposited on flat silicon substrates display a pronounced change in structure at a concentration of {approximately}11 at.% B. At lower levels of B, grain sizes of about 100 nm are observed. AFM images show the roughness of these films to be about 20 nm rms. Films deposited on capsules do not show the same behavior. In particular, at 15 at.% B, the capsule coatings have nodular structure with an rms roughness of greater than 50 nm. When viewed in cross section, however, no structure is seen with either the flat films or the capsule coatings. They believe that differences in substrate temperature may be largely responsible for the observed behavior.},
doi = {},
journal = {Fusion Technology},
number = 2,
volume = 35,
place = {United States},
year = {1999},
month = {3}
}