Generation of mask patterns for diffractive optical elements using Mathematica{sup T}{sup M}
- School of Physics and Center for Optical Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0430 (United States)
The generation of binary and grayscale masks used in the fabrication of diffractive optical elements is usually performed using a proprietary piece of software or a computer-aided drafting package. Once the pattern is computed or designed, it must be output to a plotting or imaging system that will produce a reticle plate. This article describes a number of short Mathematica modules that can be used to generate binary and grayscale patterns in a PostScript-compatible format. Approaches to ensure that the patterns are directly related to the function of the element and the design wavelength are discussed. A procedure to preserve the scale of the graphic output when it is transferred to another application is given. Examples of surfaces for a 100 mm effective focal length lens and an Alvarez surface are given. {copyright} {ital 1996 American Institute of Physics.}
- OSTI ID:
- 285851
- Journal Information:
- Computers in Physics, Vol. 10, Issue 4; Other Information: PBD: Jul 1996
- Country of Publication:
- United States
- Language:
- English
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