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Title: The Advanced Photon Source list of parameters

Technical Report ·
DOI:https://doi.org/10.2172/283724· OSTI ID:283724

The Advanced Photon Source (APS) is a third-generation synchrotron radiation source that stores positrons in a storage ring. The choice of positrons as accelerating particles was motivated by the usual reason: to eliminate the degradation of the beam caused by trapping of positively charged dust particles or ions. The third-generation synchrotron radiation sources are designed to have low beam emittance and many straight sections for insertion devices. The parameter list is comprised of three basic systems: the injection system, the storage ring system, and the experimental facilities system. The components of the injection system are listed according to the causal flow of positrons. Below we briefly list the individual components of the injection system, with the names of people responsible for managing these machines in parentheses: the linac system; electron linac-target-positron linac (Marion White); low energy transport line from linac to the PAR (Michael Borland); positron accumulator ring or PAR (Michael Borland); low energy transport line from PAR to injector synchrotron (Michael Borland); injector synchrotron (Stephen Milton); high energy transport line from injector synchrotron to storage ring (Stephen Milton). The storage ring system, managed by Glenn Decker, uses the Chasman-Green lattice. The APS storage ring, 1104 m in circumference, has 40 periodic sectors. Six are used to house hardware and 34 serve as insertion devices. Another 34 beamlines emit radiation from bending magnets. The experimental facilities system`s parameters include parameters for both an undulator and a wiggler.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
283724
Report Number(s):
ANL/APS/TB-26; ON: DE96013895; TRN: 96:020904
Resource Relation:
Other Information: PBD: Jul 1996
Country of Publication:
United States
Language:
English