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Title: Plasma source ion implantation of ammonia into electroplated chromium

Abstract

Ammonia gas (NH{sub 3}) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 {times} 10{sup 17} N-at/cm{sup 2} is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4.

Authors:
; ; ;  [1];  [2]
  1. Los Alamos National Lab., NM (United States)
  2. Los Alamos National Lab., NM (United States)|[Univ. of Wisconsin, Madison, WI (United States)
Publication Date:
Research Org.:
Los Alamos National Lab., NM (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
28338
Report Number(s):
LA-UR-95-341; CONF-950201-4
ON: DE95006275; TRN: 95:008220
DOE Contract Number:
W-7405-ENG-36
Resource Type:
Technical Report
Resource Relation:
Conference: Annual meeting and exhibition of the Minerals, Metals and Materials Society (TMS), Las Vegas, NV (United States), 12-16 Feb 1995; Other Information: PBD: [1995]
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 66 PHYSICS; CHROMIUM; ION IMPLANTATION; WEAR RESISTANCE; NITROGEN IONS; SERVICE LIFE; EXPERIMENTAL DATA; ELECTRODEPOSITED COATINGS

Citation Formats

Scheuer, J.T., Walter, K.C., Rej, D.J., Nastasi, M., and Blanchard, J.P.. Plasma source ion implantation of ammonia into electroplated chromium. United States: N. p., 1995. Web. doi:10.2172/28338.
Scheuer, J.T., Walter, K.C., Rej, D.J., Nastasi, M., & Blanchard, J.P.. Plasma source ion implantation of ammonia into electroplated chromium. United States. doi:10.2172/28338.
Scheuer, J.T., Walter, K.C., Rej, D.J., Nastasi, M., and Blanchard, J.P.. Wed . "Plasma source ion implantation of ammonia into electroplated chromium". United States. doi:10.2172/28338. https://www.osti.gov/servlets/purl/28338.
@article{osti_28338,
title = {Plasma source ion implantation of ammonia into electroplated chromium},
author = {Scheuer, J.T. and Walter, K.C. and Rej, D.J. and Nastasi, M. and Blanchard, J.P.},
abstractNote = {Ammonia gas (NH{sub 3}) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 {times} 10{sup 17} N-at/cm{sup 2} is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4.},
doi = {10.2172/28338},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Feb 01 00:00:00 EST 1995},
month = {Wed Feb 01 00:00:00 EST 1995}
}

Technical Report:

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