Electrochemical deposition of Pd, Ti, and Ge for applications in GaAs technology
Journal Article
·
· Journal of the Electrochemical Society
- Technische Hochschule Darmstadt (Germany). Inst. fuer Hochfrequenztechnik
The electrolytic deposition of Pd, Ti, and Ge is demonstrated. A process for depositing smooth surfaces of layers from 10 to 100 nm and thicker is described. Applications of this technology for Schottky and ohmic contacts are shown and the advantages to similar evaporated metallization schemes are listed.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 251041
- Journal Information:
- Journal of the Electrochemical Society, Vol. 143, Issue 4; Other Information: PBD: Apr 1996
- Country of Publication:
- United States
- Language:
- English
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