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Magnetic metamaterials by ion-implantation

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/5.0239106· OSTI ID:2477956
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  1. Uppsala Univ. (Sweden)
  2. Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany)
  3. ALBA Synchrotron Light Source, Cerdanyola del Valles (Spain)
  4. Brookhaven National Laboratory (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)

We present a method for the additive fabrication of planar magnetic nanoarrays with minimal surface roughness. Synthesis is accomplished by combining electron-beam lithography, used to generate nanometric patterned masks, with ion implantation in thin films. By implanting 56Fe+ ions, we are able to introduce magnetic functionality in a controlled manner into continuous Pd thin films, achieving 3D spatial resolution down to a few tens of nanometers. Our results demonstrate the application of this technique in fabricating square artificial spin ice lattices, which exhibit well-defined magnetization textures and interactions among the patterned magnetic elements.

Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)
Grant/Contract Number:
SC0012704
OSTI ID:
2477956
Report Number(s):
BNL-226355-2024-JAAM
Journal Information:
Applied Physics Letters, Vol. 125, Issue 20; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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