A review of plasma-assisted deposition methods for amorphous carbon thin and ultrathin films with a focus on the cathodic vacuum arc technique

Roy, Anurag; Wang, Shengxi; Komvopoulos, Kyriakos

doi:10.1557/s43578-022-00868-9

A review of plasma-assisted deposition methods for amorphous carbon thin and ultrathin films with a focus on the cathodic vacuum arc technique

Journal Article · 05 January 2023 · Journal of Materials Research

DOI:https://doi.org/10.1557/s43578-022-00868-9· OSTI ID:2422838

Roy, Anurag; Wang, Shengxi;

Not provided.

Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Molecular Foundry

Sponsoring Organization:: USDOE

DOE Contract Number:: AC02-05CH11231

OSTI ID:: 2422838

Journal Information:: Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 3 Vol. 38; ISSN 0884-2914

Publisher:: Springer Nature

Country of Publication:: United States

Language:: English

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