Selective Area Epitaxy of GaN Nanostructures: MBE Growth and Morphological Analysis
Journal Article
·
· Crystal Growth and Design
- Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, United States
- Centre Energie, Matériaux et Télécommunications, Institut National de la Recherche Scientifique (INRS)-Université du Québec, 1650 Boulevard Lionel-Boulet, Varennes, Quebec J3X 1S2, Canada
Not provided.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- 89233218CNA000001
- OSTI ID:
- 2422552
- Journal Information:
- Crystal Growth and Design, Journal Name: Crystal Growth and Design Journal Issue: 6 Vol. 23; ISSN 1528-7483
- Publisher:
- American Chemical Society
- Country of Publication:
- United States
- Language:
- English
Similar Records
Phase-field simulations of GaN growth by selective area epitaxy on complex mask geometries
Phase-field simulations of GaN growth by selective area epitaxy from complex mask geometries
Selective area growth of metal nanostructures
Journal Article
·
2015
· Journal of Applied Physics
·
OSTI ID:1235275
Phase-field simulations of GaN growth by selective area epitaxy from complex mask geometries
Journal Article
·
2015
· Journal of Applied Physics
·
OSTI ID:22410218
Selective area growth of metal nanostructures
Journal Article
·
1996
· Applied Physics Letters
·
OSTI ID:279975