Doping the Undopable: Hybrid Molecular Beam Epitaxy Growth, n-Type Doping, and Field-Effect Transistor Using CaSnO 3
- Department of Chemical Engineering and Materials Science, University of Minnesota−Twin Cities, Minneapolis, Minnesota 55455, United States; OSTI
- Department of Electrical and Computer Engineering, University of Minnesota−Twin Cities, Minneapolis, Minnesota 55455, United States
- Department of Chemical Engineering and Materials Science, University of Minnesota−Twin Cities, Minneapolis, Minnesota 55455, United States
- Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, United States
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States
- Department of Materials Science and Engineering, Drexel University, Philadelphia, Pennsylvania 19104, United States; Centro de Investigación en Química Biolóxica e Materiais Moleculares (CIQUS), Universidade de Santiago de Compostela, Santiago de Compostela, 15782, Spain
- Department of Materials Science and Engineering, Drexel University, Philadelphia, Pennsylvania 19104, United States
- School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, United States; Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, New York 14853, United States
Not provided.
- Research Organization:
- Univ. of Delaware, Newark, DE (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE)
- DOE Contract Number:
- EE0009344
- OSTI ID:
- 2418087
- Journal Information:
- ACS Nano, Journal Name: ACS Nano Journal Issue: 17 Vol. 17; ISSN 1936-0851
- Publisher:
- American Chemical Society (ACS)
- Country of Publication:
- United States
- Language:
- English
Similar Records
Self-regulated growth of CaVO 3 by hybrid molecular beam epitaxy
Molecular-beam epitaxial growth and characterization of modulation-doped field-effect transistor heterostructures using InAs/GaAs superlattice channels
Hybrid molecular beam epitaxy for the growth of stoichiometric BaSnO{sub 3}
Journal Article
·
2017
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
·
OSTI ID:1541659
Molecular-beam epitaxial growth and characterization of modulation-doped field-effect transistor heterostructures using InAs/GaAs superlattice channels
Journal Article
·
1993
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
·
OSTI ID:147005
Hybrid molecular beam epitaxy for the growth of stoichiometric BaSnO{sub 3}
Journal Article
·
2015
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
·
OSTI ID:22479657