Variation-Resilient FeFET-Based In-Memory Computing Leveraging Probabilistic Deep Learning
Journal Article
·
· IEEE Transactions on Electron Devices
- Pennsylvania State Univ., University Park, PA (United States); Penn State
- Pennsylvania State Univ., University Park, PA (United States)
- University of Notre Dame, IN (United States)
Reliability issues stemming from device level nonidealities of nonvolatile emerging technologies like ferroelectric field-effect transistors (FeFETs), especially at scaled dimensions, cause substantial degradation in the accuracy of in-memory crossbar-based AI systems. Here, in this work, we present a variation-aware design technique to characterize the device level variations and to mitigate their impact on hardware accuracy employing a Bayesian neural network (BNN) approach. An effective conductance variation model is derived from the experimental measurements of cycle-to-cycle (C2C) and device-to-device (D2D) variations performed on FeFET devices fabricated using 28 nm high-k metal gate technology. The variations were found to be a function of different conductance states within the given programming range, which sharply contrasts earlier efforts where a fixed variation dispersion was considered for all conductance values. Such variation characteristics formulated for three different device sizes at different read voltages were provided as prior variation information to the BNN to yield a more exact and reliable inference. Near-ideal accuracy for shallow networks (MLP5 and LeNet models) on the MNIST dataset and limited accuracy decline by ~3.8%–16.1% for deeper AlexNet models on CIFAR10 dataset under a wide range of variations corresponding to different device sizes and read voltages, demonstrates the efficacy of our proposed device-algorithm co-design technique.
- Research Organization:
- Pennsylvania State Univ., University Park, PA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC0021118
- OSTI ID:
- 2341283
- Journal Information:
- IEEE Transactions on Electron Devices, Journal Name: IEEE Transactions on Electron Devices Journal Issue: 5 Vol. 71; ISSN 0018-9383
- Publisher:
- IEEECopyright Statement
- Country of Publication:
- United States
- Language:
- English
Similar Records
Amorphous Indium Oxide Channel FEFETs With Write Voltage of 0.9 V and Endurance >1012 for Refresh-Free Embedded Memory
SwitchX: Gmin-Gmax Switching for Energy-efficient and Robust Implementation of Binarized Neural Networks on ReRAM Xbars
Ferroelectric capacitors and field-effect transistors as in-memory computing elements for machine learning workloads
Journal Article
·
Mon Apr 07 20:00:00 EDT 2025
· IEEE Transactions on Electron Devices
·
OSTI ID:2571042
SwitchX: Gmin-Gmax Switching for Energy-efficient and Robust Implementation of Binarized Neural Networks on ReRAM Xbars
Journal Article
·
Tue May 16 20:00:00 EDT 2023
· ACM Transactions on Design Automation of Electronic Systems
·
OSTI ID:2422211
Ferroelectric capacitors and field-effect transistors as in-memory computing elements for machine learning workloads
Journal Article
·
Tue Apr 23 20:00:00 EDT 2024
· Scientific Reports
·
OSTI ID:2581900