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Title: Observations of Guinier-Preston zones in an as-deposited Al-1wt.%Si-0.5wt.%Cu thin film

Abstract

Aluminum-copper (Al-Cu) and aluminum-silicon-copper (Al-Si-Cu) films are widely used as interconnects and contacts in contemporary very large scale integration (VLSI) technology. Cu alloying in Al results in the formation of intermetallic Al{sub 2}Cu precipitates, which increase corrosion susceptibility as well as process difficulty. Understanding the formation of Al2Cu theta-phase precipitates within Al alloy thin films is thus of great scientific and technical value. For the first time Guinier-Preston zones are observed by HRTEM to form on Al{l_brace}111{r_brace} planes in an as-deposited Al-1wt%Si-0.5wt%Cu thin films sputtered on oxidized Si substrate. At present time the chemical nature (Si or Cu) of the precipitation in the observed GP zones is still uncertain.

Authors:
 [1]; ;  [2]
  1. Vanguard International Semiconductor Corp., Hsinchu (Taiwan, Province of China)
  2. National Chiao Tung Univ., Hsinchu (Taiwan, Province of China). Institutes of Materials Science and Engineering
Publication Date:
OSTI Identifier:
233904
Resource Type:
Journal Article
Journal Name:
Scripta Materialia
Additional Journal Information:
Journal Volume: 34; Journal Issue: 9; Other Information: PBD: 1 May 1996
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM BASE ALLOYS; MICROSTRUCTURE; SILICON ALLOYS; COPPER ADDITIONS; SILICON; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; GRAIN SIZE; PRECIPITATION; INTERMETALLIC COMPOUNDS; SOLID SOLUTIONS; TETRAGONAL LATTICES; SEGREGATION; GRAIN BOUNDARIES; ENERGY-LOSS SPECTROSCOPY

Citation Formats

Tung, C H, Chiu, R L, and Chang, P H. Observations of Guinier-Preston zones in an as-deposited Al-1wt.%Si-0.5wt.%Cu thin film. United States: N. p., 1996. Web. doi:10.1016/1359-6462(96)00004-8.
Tung, C H, Chiu, R L, & Chang, P H. Observations of Guinier-Preston zones in an as-deposited Al-1wt.%Si-0.5wt.%Cu thin film. United States. https://doi.org/10.1016/1359-6462(96)00004-8
Tung, C H, Chiu, R L, and Chang, P H. 1996. "Observations of Guinier-Preston zones in an as-deposited Al-1wt.%Si-0.5wt.%Cu thin film". United States. https://doi.org/10.1016/1359-6462(96)00004-8.
@article{osti_233904,
title = {Observations of Guinier-Preston zones in an as-deposited Al-1wt.%Si-0.5wt.%Cu thin film},
author = {Tung, C H and Chiu, R L and Chang, P H},
abstractNote = {Aluminum-copper (Al-Cu) and aluminum-silicon-copper (Al-Si-Cu) films are widely used as interconnects and contacts in contemporary very large scale integration (VLSI) technology. Cu alloying in Al results in the formation of intermetallic Al{sub 2}Cu precipitates, which increase corrosion susceptibility as well as process difficulty. Understanding the formation of Al2Cu theta-phase precipitates within Al alloy thin films is thus of great scientific and technical value. For the first time Guinier-Preston zones are observed by HRTEM to form on Al{l_brace}111{r_brace} planes in an as-deposited Al-1wt%Si-0.5wt%Cu thin films sputtered on oxidized Si substrate. At present time the chemical nature (Si or Cu) of the precipitation in the observed GP zones is still uncertain.},
doi = {10.1016/1359-6462(96)00004-8},
url = {https://www.osti.gov/biblio/233904}, journal = {Scripta Materialia},
number = 9,
volume = 34,
place = {United States},
year = {1996},
month = {5}
}