Selective, pulsed CVD of platinum on microfilament gas sensors
- Sandia National Labs., Albuquerque, NM (United States)
- Utah Univ., Salt Lake City, UT (United States)
- Massachusetts Inst. of Tech., Cambridge, MA (United States)
A post-processing, selective micro-chemical vapor deposition (``micro-CVD``) technology for the deposition of catalytic films on surface-micromachined, nitride-passivated polysilicon filaments has been investigated. Atmospheric pressure deposition of Pt on microfilaments was accomplished by thermal decomposition of Pt acetylacetonate; deposition occurs selectively only on those filaments which are electrically heated. Catalyst morphology, characterized by SEM, can be controlled by altering deposition time, filament temperature, and through the use of pulsed heating of the filament during deposition. Morphology plays an important role in determining the sensitivity of these devices when used as combustible gas sensors.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 231188
- Report Number(s):
- SAND-96-0965C; CONF-960673-3; ON: DE96009172
- Resource Relation:
- Conference: Solid-state sensor and actuator workshop, Hilton Head, SC (United States), 2-6 Jun 1996; Other Information: PBD: [1996]
- Country of Publication:
- United States
- Language:
- English
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