Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts
We utilize hexamethyldisilazane (HMDS) based self assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching front side n/polySi between fingers; thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE National Renewable Energy Laboratory (NREL)
- DOE Contract Number:
- AC36-08GO28308
- OSTI ID:
- 2309710
- Report Number(s):
- NREL/CP-5900-88884; MainId:89663; UUID:14b2e7fb-4e9b-48ff-b13d-edfaf5e31693; MainAdminId:71880
- Country of Publication:
- United States
- Language:
- English
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journal | April 2009 |
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journal | October 2005 |
Deep UV photochemistry and patterning of self-assembled monolayer films
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journal | April 1992 |
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